Methods for measuring contact resistances of “metal – thermoelectric material” structures (part 1)
Keywords:
electrical contact resistance, measurement, accuracy, thermoelectric power convertersAbstract
An overview of existing methods for measuring electrical contact resistance is presented. An analysis of their accuracy, advantages and disadvantages, as well as the possibilities of using them in thermoelectricity for the study and optimization of "metal – thermoelectric material" structures is conducted. Bibl. 11, Figs 14.
References
1. Cox R.H., Strack H. (1969). Sol. St. Electron., 12, 89.
2. Heime K., Konig U., Kohn E., Wortmann A. (1974). Sol. St. Electron., 17, 835.
3. Berger H.H. J. (1972). Electrochem. Soc., 119, 507.
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5. Misra P., Nagaraju J. (2004). Test facility for simultaneous measurement of electrical and thermal contact resistance. Rev. Sci. Instr., Aug.2004, doi 10.1063/1.1775316
6. Maheshappa N.D., Nagaraju J., Krishna Murthy N.V. (1998). A facility for electrical resistance contact measurement. Rev. Sci. Instr., Mar.1998, doi 10.1063/1.1148810
7. Deepak, Krishna H. (2007). Measurement of small specific contact resistance of metals with resistive semiconductors. J. El. Mat., 36 (5), 598 – 605, doi 10.1007/s11664-007-0091-y
8. Maheshappa H.D., Nagaraju J., Krishna Murthy M.V. (1998). A facility for electrical resistance contact measurement. Rev. Sci. Instr., Mar. doi 10.1063/1.1148810
9. Holgate T.C., Han L., Wu NY, Bojesen E.D., Cristensen M., Iversen Bo.B., Nong N.V., Pryds N. Characterization of the interface between Fe-Cr alloy and the p-type thermoelectric oxide Ca3Co4O9.
10. Schroder D.K. (2006). Semiconductor material and device characterization. IEEE press. A John Wiley & Sons, Inc. Publication.
11. Gupta R.P., McCarty R., Sharp J. (2013). Practical contact resistance measurement method for bulk Bi2Te3 based thermoelectric devices. J. El. Mat.
12. Cox R.H., Strack H. (1969). Sol. St. Electron., 12, 89.
13. Heime K., Konig U., Kohn E., Wortmann A. (1974). Sol. St. Electron., 17, 835.
14. Berger H.H. J. (1972). Electrochem. Soc., 119, 507.
15. Gutai L., Mojres T. Appl.Phys. Lett. (1975). 26, 325.
16. Misra P., Nagaraju J. (2004). Test facility for simultaneous measurement of electrical and thermal contact resistance. Rev. Sci. Instr., Aug.2004, doi 10.1063/1.1775316
17. Maheshappa N.D., Nagaraju J., Krishna Murthy N.V. (1998). A facility for electrical resistance contact measurement. Rev. Sci. Instr., Mar.1998, doi 10.1063/1.1148810
18. Deepak, Krishna H. (2007). Measurement of small specific contact resistance of metals with resistive semiconductors. J. El. Mat., 36 (5), 598 – 605, doi 10.1007/s11664-007-0091-y
19. Maheshappa H.D., Nagaraju J., Krishna Murthy M.V. (1998). A facility for electrical resistance contact measurement. Rev. Sci. Instr., Mar. doi 10.1063/1.1148810
20. Holgate T.C., Han L., Wu NY, Bojesen E.D., Cristensen M., Iversen Bo.B., Nong N.V., Pryds N. Characterization of the interface between Fe-Cr alloy and the p-type thermoelectric oxide Ca3Co4O9.
21. Schroder D.K. (2006). Semiconductor material and device characterization. IEEE press. A John Wiley & Sons, Inc. Publication.
22. Gupta R.P., McCarty R., Sharp J. (2013). Practical contact resistance measurement method for bulk Bi2Te3 based thermoelectric devices. J. El. Mat.
